Multi zone substrate support for ALD film property correction and tunability
US11236422B2 · kind B2 · utility
3Cited by
20References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 15, 2018 |
| Grant date | Feb 1, 2022 |
| Priority date | — |
| Expiry date | Jun 10, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67248
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A substrate processing system configured to perform a deposition process on a substrate includes a substrate support including a plurality of zones and a plurality of resistive heaters arranged throughout the plurality of zones. The plurality of resistive heaters includes separately-controllable resistive heaters arranged in respective ones of the plurality of zones. A controller is configured to, during the deposition process, control the plurality of resistive heaters to selectively adjust temperatures within the plurality of zones.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.