In-situ DC plasma for cleaning pedestal heater
US11260432B2 · kind B2 · utility
0Cited by
1References
3Claims
0Family size
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Key dates
| Filing date | Sep 18, 2020 |
| Grant date | Mar 1, 2022 |
| Priority date | — |
| Expiry date | Sep 18, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68792
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Substrate supports, substrate support assemblies and methods of using an arc generated between a first electrode and a second electrode to clean a support surface. The first electrode comprises a plurality of first branches which are interdigitated with a plurality of branches of the second electrode in a finger-joint like pattern creating a gap between the first electrode and the second electrode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.