Post exposure processing apparatus

US11262662B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Viachslav Babayan · Sunnyvale, US
• Ludovic Godet · Sunnyvale, US
• Kyle M. Hanson · Kalispell, US
• Robert B. Moore · Bigfork, US

Key dates

• Filing date: Oct 2, 2020
• Grant date: Mar 1, 2022
• Expiry date: Oct 2, 2040

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/67248
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

Implementations described herein relate to a platform apparatus for post exposure processing. In one implementation, a platform apparatus includes a plumbing module and a process module. The process module further includes a central region having a robot disposed therein, and a plurality of process stations disposed about the central region and sharing the plumbing module. Each process station includes a process chamber and a post process chamber in a stacked arrangement. The process chamber includes a chamber body defining a process volume, a door coupled to the chamber body, a first electrode coupled to the door, and a power source communicatively coupled to the first electrode.