Substrate processing systems, apparatus, and methods with factory interface environmental controls

US11282724B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Sushant S. Koshti · Sunnyvale, US
• Dean C. Hruzek · Cedar Park, US
• Ayan Majumdar · San Jose, US
• John C. Menk · Round Rock, US
• Helder Lee · San Jose, US
• Sangram Patil · Mountain View, US
• Sanjay Rajaram · Sunnyvale, US
• Douglas B. Baumgarten · Round Rock, US
• Nir Merry · Mountain View, US

Key dates

• Filing date: Aug 7, 2019
• Grant date: Mar 22, 2022
• Expiry date: Aug 7, 2039

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/67772
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A factory interface for an electronic device processing system includes a factory interface chamber, an inert gas supply conduit, an exhaust conduit and an inert gas recirculation system. The inert gas supply conduit supplies an inert gas into the factory interface chamber. The exhaust conduit exhausts the inert gas from the factory interface chamber. The inert gas recirculation system recirculates the inert gas exhausted from the factory interface chamber back into the factory interface chamber.