Method of controlling ion energy distribution using a pulse generator
US11284500B2 · kind B2 · utility
12Cited by
415References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 20, 2020 |
| Grant date | Mar 22, 2022 |
| Priority date | — |
| Expiry date | Jul 20, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2242/20
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Embodiments of this disclosure describe an electrode biasing scheme that enables maintaining a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate that consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.