Guided patterning device inspection
US11287748B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Feb 19, 2019 |
| Grant date | Mar 29, 2022 |
| Priority date | — |
| Expiry date | Feb 19, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70641
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for inspection of a patterning device. The method includes obtaining (i) patterning device apparatus data of a patterning device making process, (ii) a patterning device substrate map based on the patterning device apparatus data, and (iii) predicted process window limiting pattern locations corresponding to the patterning device based on the patterning device substrate map, and based on the process window limiting pattern locations, guiding a patterning device inspection apparatus to the process window limiting pattern locations for defect inspection.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.