Processing of semiconductors using vaporized solvents
US11289323B2 · kind B2 · utility
1Cited by
3References
8Claims
0Family size
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Key dates
| Filing date | Dec 3, 2018 |
| Grant date | Mar 29, 2022 |
| Priority date | — |
| Expiry date | Dec 23, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67213
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Processes and apparatuses for the treatment of semiconductor workpieces are provided. In some embodiments, a method can include placing the workpiece into a process chamber; vaporizing a solvent to create a vaporized solvent; introducing the vaporized solvent into the process chamber; and exposing the workpiece to the vaporized solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.