Patent · US Active

Wafer processing method

US11302578B2 · kind B2 · utility

0Cited by
1References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 8, 2020
Grant dateApr 12, 2022
Priority date
Expiry dateMay 8, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2223/5446
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A wafer processing method includes a polyolefin sheet providing step of positioning a wafer in an inside opening of a ring frame and providing a polyolefin sheet on a back side or a front side of the wafer and on a back side of the ring frame, a uniting step of heating the polyolefin sheet as applying a pressure to the polyolefin sheet to thereby unite the wafer and the ring frame through the polyolefin sheet by thermocompression bonding, a dividing step of applying a laser beam to the wafer to form modified layers in the wafer, thereby dividing the wafer into individual device chips, and a pickup step of heating the polyolefin sheet in each of the plurality of separate regions corresponding to each device chip, pushing up each device chip through the polyolefin sheet, then picking up each device chip from the polyolefin sheet.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.