Gas distribution plate with high aspect ratio holes and a high hole density
US11332827B2 · kind B2 · utility
0Cited by
43References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 26, 2020 |
| Grant date | May 17, 2022 |
| Priority date | — |
| Expiry date | May 27, 2040 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45544
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A gas distribution plate for a showerhead assembly of a processing chamber may include at least a first plate and second plate. The first plate may include a first plurality holes each having a diameter of at least about 100 um. The second plate may include a second plurality of holes each having a diameter of at least about 100 um. Further, each of the first plurality of holes is aligned with a respective one of the second plurality of holes forming a plurality of interconnected holes. Each of the interconnected holes is isolated from each other interconnected holes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.