Impedance matching apparatus and control method
US11348761B2 · kind B2 · utility
3Cited by
22References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 4, 2020 |
| Grant date | May 31, 2022 |
| Priority date | — |
| Expiry date | Sep 4, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system includes a plasma chamber coupled to a power source, and an impedance matching network coupled between the power source and the plasma chamber, wherein the impedance matching network comprises an L-shaped network and a first adjustable inductor coupled between an input of the plasma chamber and ground, and wherein the impedance matching network is configured such that, in a predetermined frequency range, an impedance of the impedance matching network and the plasma chamber is substantially equal to an impedance of the power source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.