Enhanced ignition in inductively coupled plasmas for workpiece processing
US11348784B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Aug 22, 2019 |
| Grant date | May 31, 2022 |
| Priority date | — |
| Expiry date | Dec 31, 2039 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E30/10
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Plasma processing apparatus and associated methods are provided. In one example, a plasma processing apparatus includes a plasma chamber. The plasma processing apparatus includes a dielectric wall forming at least a portion of the plasma chamber. The plasma processing apparatus includes an inductive coupling element located proximate the dielectric wall. The plasma processing apparatus includes an ultraviolet light source configured to emit an ultraviolet light beam onto a metal surface that faces an interior volume of the plasma chamber. The plasma processing apparatus includes a controller configured to control the ultraviolet light source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.