Patent · US Active

Mirror, in particular for a microlithographic projection exposure system

US11360393B2 · kind B2 · utility

1Cited by

0References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Ben Wylie-Van Eerd · Wellington, NZ
Frederik Bijkerk · Bosch en Duin, NL
Kerstin Hild · Schwäbisch Gmünd, DE
Toralf Gruner · Hennef (Sieg), DE
Stefan Schulte · Marburg, DE
Simone Weyler · Heidenheim, DE

Key dates

Filing date	Feb 10, 2020
Grant date	Jun 14, 2022
Priority date	—
Expiry date	Jun 20, 2040

Classification

Technology area (CPC G)Physics
CPC primaryG21K2201/067
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A mirror having a mirror substrate (12, 32, 52), a reflection layer stack (21, 41, 61) reflecting electromagnetic radiation having an operating wavelength that is incident on the optical effective surface (11, 31, 51), and at least one piezoelectric layer (16, 36, 56), arranged between the substrate and the reflection layer stack and to which an electric field producing a locally variable deformation is applied. A first electrode arrangement (20, 40, 60) situated on the side of the piezoelectric layer faces the reflection layer stack, and a second electrode arrangement (14, 34, 54) is situated on the side of the piezoelectric layer facing the mirror substrate. Optionally, a bracing layer (98) is provided, which limits sinking of the piezoelectric layer (96) into the mirror substrate (92) when an electric field is applied, in comparison with an analogous construction lacking the bracing layer, thereby increasing the piezoelectric layer's effective deflection.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.