Processing of workpieces with reactive species generated using alkyl halide
US11387111B2 · kind B2 · utility
1Cited by
12References
18Claims
0Family size
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Key dates
| Filing date | Apr 10, 2019 |
| Grant date | Jul 12, 2022 |
| Priority date | — |
| Expiry date | Mar 7, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3244
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Methods for material removal of a film, such as a metal nitride film, from a workpiece are provided. One example implementation is directed to a method for processing a workpiece. The workpiece can include a film (e.g., a metal nitride film). The method can include generating one or more species (e.g., hydrogen radicals, excited inert gas molecules, etc.). The method can include mixing alkyl halide with the one or more species to generate one or more alkyl radicals. The method can include exposing the film to the one or more alkyl radicals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.