Surface pretreatment process to improve quality of oxide films produced by remote plasma
US11495437B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | May 20, 2020 |
| Grant date | Nov 8, 2022 |
| Priority date | — |
| Expiry date | Apr 21, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02315
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Processes for oxidation of a workpiece are provided. In one example, a method includes placing a workpiece on a workpiece support in a processing chamber. The method includes performing a pre-oxidation treatment process on the workpiece in the processing chamber to initiate oxide layer formation on the workpiece. The method includes performing a remote plasma oxidation process on the workpiece in the processing chamber to continue the oxide layer formation on the workpiece. Subsequent to performing the pre-oxidation treatment process and the remote plasma oxidation process, the method can include removing the workpiece from the processing chamber. In some embodiments, the remote plasma oxidation process can include generating a first plasma from a remote plasma oxidation process gas in a plasma chamber; filtering species generated in the plasma to generate a mixture having one or more radicals; and exposing the one or more radicals to the workpiece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.