Patent · US Active

Pedestal support design for precise chamber matching and process control

US11501957B2 · kind B2 · utility

1Cited by

4References

17Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Gopu Krishna · Bengaluru, IN
Alexander S. Polyak · Palm Coast, US
Sanjeev Baluja · Campbell, US

Key dates

Filing date	Sep 3, 2020
Grant date	Nov 15, 2022
Priority date	—
Expiry date	Jan 29, 2041

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/20214
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

Process chambers and methods for calibrating components of a processing chamber while the chamber volume is under vacuum are described. The process chamber includes a motor shaft connected to the process chamber with a plurality of motor bolts. A support plate is positioned under the chamber floor to accommodate for deflection of the chamber floor due to vacuum conditions within the chamber volume. A bellows assembly extending from the chamber floor to the support plate maintains vacuum conditions within the chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.