Separation of contributions to metrology data
US11520239B2 · kind B2 · utility
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3References
21Claims
0Family size
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Key dates
| Filing date | Feb 17, 2017 |
| Grant date | Dec 6, 2022 |
| Priority date | — |
| Expiry date | Feb 17, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70641
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method including: computing a value of a first variable of a pattern of, or for, a substrate processed by a patterning process by combining a fingerprint of the first variable on the substrate and a certain value of the first variable; and determining a value of a second variable of the pattern based at least in part on the computed value of the first variable.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.