Hydrogen assisted atmospheric radical oxidation
US11521847B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Apr 29, 2020 |
| Grant date | Dec 6, 2022 |
| Priority date | — |
| Expiry date | Oct 3, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6719
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Apparatus, systems, and methods for processing workpieces are provided. In one example implementation, a hydrogen gas mixed with an inert gas can be reacted with an oxygen gas to oxidize a workpiece at atmospheric pressure. A chemical reaction of a hydrogen gas with an oxygen gas facilitated by a hot workpiece surface can positively affect an oxidation process. A reaction speed of the chemical reaction can be slowed down by mixing the hydrogen gas with an inert gas. Such mixture can effectively reduce a partial pressure of the hydrogen gas. As such, the oxidation process can be carried out at atmospheric pressure, thereby, in an atmospheric thermal processing chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.