Capacitive sensing data integration for plasma chamber condition monitoring

US11545346B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Yaoling Pan · Santa Clara, US
• Patrick Tae · Sunnyvale, US
• Michael D. Willwerth · Campbell, US
• Leonard Tedeschi · San Jose, US
• Kiyki-Shiy Shang · Störitzseestraße, US
• Mikhail Taraboukhine · Santa Clara, US
• Charles Hardy · San Marcos, US
• Sivasankar Nagarajan · Kanchinakote, IN

Key dates

• Filing date: Mar 6, 2020
• Grant date: Jan 3, 2023
• Expiry date: Feb 28, 2041

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/31705
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

Capacitive sensors and capacitive sensing data integration for plasma chamber condition monitoring are described. In an example, a plasma chamber monitoring system includes a plurality of capacitive sensors, a capacitance digital converter, and an applied process server coupled to the capacitance digital converter, the applied process server including a system software. The capacitance digital converter includes an isolation interface coupled to the plurality of capacitive sensors, a power supply coupled to the isolation interface, a field-programmable gate-array firmware coupled to the isolation interface, and an application-specific integrated circuit coupled to the field-programmable gate-array firmware.