Resonant process monitor

US11551905B2 · kind B2 · utility

Assignee

• Intel Corporation · US

Inventors

• Yaoling Pan · Santa Clara, US
• Vijaykumar Krithivasan · Chandler, US
• Shimin Mao · Union City, US
• Kelvin Chan · San Ramon, US
• Michael D. Willwerth · Campbell, US
• Anantha K. Subramani · San Jose, US
• Ashish Goel · Stanford, US
• Chih-shun Lu · Los Altos, US
• Philip Allan Kraus · San Jose, US
• Patrick Tae · Sunnyvale, US
• Leonard Tedeschi · San Jose, US

Key dates

• Filing date: Mar 19, 2018
• Grant date: Jan 10, 2023
• Expiry date: Feb 9, 2040

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/24592
• WIPO field: Electrical machinery, apparatus, energy
• WIPO sector: Electrical engineering

Abstract

Embodiments described herein include a resonant process monitor and methods of forming such a resonant process monitor. In an embodiment, the resonant process monitor includes a frame that has a first opening and a second opening. In an embodiment, a resonant body seals the first opening of the frame. In an embodiment, a first electrode on a first surface of the resonant body contacts the frame and a second electrode is on a second surface of the resonant body. Embodiments also include a back plate that seals the second opening of the frame. In an embodiment the back plate is mechanically coupled to the frame, and the resonant body, the back plate, and interior surfaces of the frame define a cavity.