Method and apparatus for inspection and metrology
US11580274B2 · kind B2 · utility
1Cited by
4References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 24, 2016 |
| Grant date | Feb 14, 2023 |
| Priority date | — |
| Expiry date | Apr 20, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2111/10
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.