Patent · US Active

Deposition system with multi-cathode and method of manufacture thereof

US11600476B2 · kind B2 · utility

0Cited by
5References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 18, 2021
Grant dateMar 7, 2023
Priority date
Expiry dateNov 19, 2041

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J37/3447
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A deposition system, and a method of operation thereof, includes: a cathode; a shroud below the cathode; a rotating shield below the cathode for exposing the cathode through the shroud and through a shield hole of the rotating shield; and a rotating pedestal for producing a material to form a carrier over the rotating pedestal, wherein the material having a non-uniformity constraint of less than 1% of a thickness of the material and the cathode having an angle between the cathode and the carrier.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.