Prashanth Kothnur
25Patents
2h-index
69Co-inventors
56Inventor score
Filing activity: Apr 3, 2008 → Dec 1, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9591738B2 | Plasma generator systems and methods of forming plasma | Electricity | 15 | Active |
| US9831074B2 | Bipolar collimator utilized in a physical vapor deposition chamber | Electricity | 3 | Active |
| US9991101B2 | Magnetron assembly for physical vapor deposition chamber | Electricity | 2 | Active |
| US9928997B2 | Apparatus for PVD dielectric deposition | Electricity | 1 | Active |
| US11970775B2 | Showerhead for providing multiple materials to a process chamber | Chemistry; Metallurgy | 1 | Active |
| US9620339B2 | Sputter source for semiconductor process chambers | Electricity | 1 | Active |
| US11393703B2 | Apparatus and method for controlling a flow process material to a deposition chamber | Electricity | 1 | Active |
| US11600476B2 | Deposition system with multi-cathode and method of manufacture thereof | Electricity | 0 | Active |
| US11692262B2 | EM source for enhanced plasma control | Electricity | 0 | Active |
| US11183375B2 | Deposition system with multi-cathode and method of manufacture thereof | Electricity | 0 | Active |
| US12325909B2 | EM source for enhanced plasma control | Electricity | 0 | Active |
| US9520267B2 | Bias voltage frequency controlled angular ion distribution in plasma processing | Electricity | 0 | Active |
| US11505863B2 | Methods for forming films on substrates | Chemistry; Metallurgy | 0 | Active |
| US11495440B2 | Plasma density control on substrate edge | Electricity | 0 | Active |
| US12131105B2 | Virtual measurement of conditions proximate to a substrate with physics-informed compressed sensing | Physics | 0 | Active |
| US12203163B2 | Methods for shaping magnetic fields during semiconductor processing | Electricity | 0 | Active |
| US11834743B2 | Segmented showerhead for uniform delivery of multiple precursors | Chemistry; Metallurgy | 0 | Active |
| US11655534B2 | Apparatus for reducing tungsten resistivity | Electricity | 0 | Active |
| US12043895B2 | Methods of using a segmented showerhead for uniform delivery of multiple pre-cursors | Chemistry; Metallurgy | 0 | Active |
| US11170982B2 | Methods and apparatus for producing low angle depositions | Electricity | 0 | Active |
| US10790121B2 | Plasma density control on substrate edge | Electricity | 0 | Active |
| US11447857B2 | Methods and apparatus for reducing tungsten resistivity | Electricity | 0 | Active |
| US12001197B2 | Eco-efficiency (sustainability) dashboard for semiconductor manufacturing | Electricity | 0 | Active |
| USD967351S1 | Showerhead reflector | General | 0 | Active |
| USD969980S1 | Deposition chamber showerhead | General | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.