Spatial optical emission spectroscopy for etch uniformity
US11668602B2 · kind B2 · utility
1Cited by
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18Claims
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Key dates
| Filing date | Apr 20, 2021 |
| Grant date | Jun 6, 2023 |
| Priority date | — |
| Expiry date | May 4, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8416
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus includes a base component and collimators housed within the base component. The collimators correspond to collection cylinders for sampling optical emission spectroscopy (OES) signals with respect to locations of a wafer in an etch chamber. The apparatus further includes a guide, operatively coupled to the plurality of collimators, to guide the sampling of the OES signals along paths for sampling the OES signals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.