Method of fabricating micro-nano structure

US11675273B2 · kind B2 · utility

Assignee

• Institute of Optics and Electronics, Chinese Academy of Sciences · CN

Inventors

• Xiangang Luo · Fremont, US
• Yinghui Guo · Beijing, CN
• Mingbo Pu · Chengdu, CN
• Xiong Li · Allen, US
• Xiaoliang Ma · Port Matilda, US
• Ping Gao · Hong Kong, CN

Key dates

• Filing date: Apr 28, 2021
• Grant date: Jun 13, 2023
• Expiry date: Apr 28, 2041

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/7035
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Provided is a method of fabricating a micro-nano structure, including: forming a reflective layer and a fluid polymer layer sequentially on a surface of a substrate; pressurizing the substrate and a mask having a micro-nano pattern to attach to each other, squeezing the fluid polymer layer into a light-transmission area of the mask, and curing the fluid polymer layer; and exposing, wherein a fluid polymer in the light-transmission area is configured to sense light under a combined effect of a transmitted light and a light reflected by the reflective layer, such that a micro-nano structure is obtained. The method solves the problem of limited diffraction, improves the processing resolution by reducing the transmission loss of evanescent waves through reflective light field enhancement, and reduces the difficulty and cost of mask processing and pattern defects by using shallow pressurizing in combination with exposure.