Intelligent correction device control system for super-resolution lithography precision mask
US11714358B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 28, 2021 |
| Grant date | Aug 1, 2023 |
| Priority date | — |
| Expiry date | Apr 28, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N23/695
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Provided is an intelligent correction device control system for a super-resolution lithography precision mask, including: a sixteen-way pneumatic fine-tuning mask deformation control subsystem configured to deform a mask, detect a force value of a mask deformation, compare the force value of the mask deformation with an output force set value, and generate a first control feedback quantity to adjust a force deforming the mask, so as to control a deformation quantity of the mask; and an alignment subsystem configured to acquire images of the mask and a substrate, and adjust a position between the mask and the substrate according to the images, so as to align the mask with the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.