Patent · US Active

Phase change memory cell galvanic corrosion prevention

US11800817B2 · kind B2 · utility

0Cited by
8References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 21, 2021
Grant dateOct 24, 2023
Priority date
Expiry dateMar 4, 2042

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10N70/8828

Abstract

A method for forming a phase-change memory cell includes depositing a metal layer over a wafer such that the metal layer covers connection structures of the wafer. The method further includes removing a portion of the metal layer such that the connection structures of the wafer remain covered by a remaining portion of the metal layer. The method further includes forming a phase-change memory stack on a stack area of the remaining portion of the metal layer. The method further includes removing the remaining portion of the metal layer except in the stack area.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.