Method for depositing high quality PVD films

US11802349B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Zihao Yang · Santa Clara, US
• Mingwei Zhu · Sunnyvale, US
• Nag B. Patibandla · Pleasanton, US
• Yong Cao · Goleta, US
• Shumao ZHANG · San Jose, US
• Zhebo Chen · San Jose, US
• Jean Lu · Palo Alto, US
• Daniel Lee Diehl · Chiba, JP
• Xianmin Tang · San Jose, US

Key dates

• Filing date: Sep 10, 2020
• Grant date: Oct 31, 2023
• Expiry date: Sep 10, 2040

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C30B33/04
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Embodiments described herein include a method for depositing a material layer on a substrate while controlling a bow of the substrate and a surface roughness of the material layer. A bias applied to the substrate while the material layer is deposited is adjusted to control the bow of the substrate. A bombardment process is performed on the material layer to improve the surface roughness of the material layer. The bias and bombardment process improve a uniformity of the material layer and reduce an occurrence of the material layer cracking due to the bow of the substrate.