Jean Lu
6Patents
5h-index
20Co-inventors
63Inventor score
Filing activity: Mar 14, 2000 → Sep 10, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6342133B2 | PVD deposition of titanium and titanium nitride layers in the same chamber without use of a collimator or a shutter | Electricity | 51 | Expired |
| US6613199B1 | Apparatus and method for physical vapor deposition using an open top hollow cathode magnetron | Electricity | 28 | Expired |
| US6589398B1 | Pasting method for eliminating flaking during nitride sputtering | Electricity | 11 | Expired |
| US6471831B2 | Apparatus and method for improving film uniformity in a physical vapor deposition system | Electricity | 8 | Expired |
| US6468404B2 | Apparatus and method for reducing redeposition in a physical vapor deposition system | Electricity | 6 | Expired |
| US11802349B2 | Method for depositing high quality PVD films | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.