Patent · US Active

Prevention of contamination of substrates during gas purging

US11810805B2 · kind B2 · utility

0Cited by
2References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 9, 2020
Grant dateNov 7, 2023
Priority date
Expiry dateNov 21, 2041

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T137/0402
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Disclosed are implementations for efficient purging of substrate carriers (and content held therein) and preventing external contaminants from entering a gas purge apparatus by coupling the gas purge apparatus to a substrate carrier, performing a first gas purging session of an environment of the substrate carrier, receiving a first signal of a first signal type, responsive to receiving the first signal, keeping the gas purge apparatus coupled to the substrate carrier, performing a second gas purging session of the environment of the substrate carrier, receiving a second signal of a second signal type, and, responsive to receiving the second signal, decoupling the purge apparatus from the substrate carrier.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.