Semiconductor chamber component cleaning systems

US11848218B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Katty Marie Lydia Gamon Guyomard · Los Altos, US
• Chidambara A. Ramalingam · Fremont, US
• Shawyon Jafari · Sunnyvale, US
• Palash Joshi · Kanchinakote, IN
• Moin Ahmed Khan · Kanchinakote, IN
• Kirubanandan Naina SHANMUGAM · Kanchinakote, IN
• Subhaschandra Shreepad Salkod · Kanchinakote, IN
• Avishek Ghosh · Espoo, FI
• David W. Groechel · Los Altos Hills, US
• Li Wu · Fremont, US
• Dorothea Buechel-Rimmel · San Jose, US

Key dates

• Filing date: Oct 22, 2020
• Grant date: Dec 19, 2023
• Expiry date: Dec 13, 2040

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/68785
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

Exemplary semiconductor chamber component cleaning systems may include a receptacle. The receptacle may include a bottom lid that may be an annulus. The annulus may be characterized by an inner annular wall and an outer annular wall. A plurality of recessed annular ledges may be defined between the inner annular wall and the outer annular wall. Each recessed annular ledge of the plurality of recessed annular ledges may be formed at a different radial position along the bottom lid. The cleaning systems may include a top lid removably coupled with the bottom lid about an exterior region of the top lid. The cleaning systems may include a tank defining a volume to receive the receptacle.