Li Wu
9Patents
4h-index
30Co-inventors
57Inventor score
Filing activity: Sep 30, 1998 → Dec 28, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6432479B1 | Method for in-situ, post deposition surface passivation of a chemical vapor deposited film | Electricity | 362 | Expired |
| US6242347A | Method for cleaning a process chamber | Emerging Cross-Sectional Technologies | 14 | Expired |
| US6468136B1 | Tungsten CMP with improved alignment mark integrity, reduced edge residue, and reduced retainer ring notching | Performing Operations; Transporting | 12 | Expired |
| US6221174A | Method of performing titanium/titanium nitride integration | Electricity | 6 | Expired |
| US6482746B2 | Computer readable medium for controlling a method of cleaning a process chamber | Emerging Cross-Sectional Technologies | 2 | Expired |
| US11848218B2 | Semiconductor chamber component cleaning systems | Electricity | 0 | Active |
| US11947219B2 | Backlight module and curved display device | Physics | 0 | Active |
| US11953718B2 | Display apparatus and display method | Physics | 0 | Active |
| US12327738B2 | Integrated semiconductor part cleaning system | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.