Patent · US Active

Compositions and methods for the electrodeposition of nanotwinned copper

US11873568B2 · kind B2 · utility

0Cited by
2References
15Claims
0Family size

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Key dates

Filing dateJun 7, 2022
Grant dateJan 16, 2024
Priority date
Expiry dateJun 7, 2042

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB82Y40/00
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A copper electroplating solution comprising a copper salt, a source of halide ions, and a linear or branched polyhydroxyl. The copper electroplating solution is used to deposit copper having a high density of nanotwinned columnar copper grains on a substrate. The linear or branched polyhydroxyl may comprise a reaction product between 2,3-epoxy-1-propanol and aminic alcohol or ammonium alcohol.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.