MacDermid Enthone Inc.
38Patents
38Active
38Granted
53Portfolio score
Filing activity: May 24, 2011 → Sep 6, 2023
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11035048B2 | Cobalt filling of interconnects | Electricity | 3 | Active |
| US10519557B2 | Leveler compositions for use in copper deposition in manufacture of microelectronics | Electricity | 2 | Active |
| US10103029B2 | Process for filling vias in the microelectronics | Electricity | 1 | Active |
| US11124888B2 | Copper deposition in wafer level packaging of integrated circuits | Electricity | 0 | Active |
| US12398480B2 | Leveler compositions for use in copper deposition in manufacture of microelectronics | Chemistry; Metallurgy | 0 | Active |
| US11168406B2 | Leveler compositions for use in copper deposition in manufacture of microelectronics | Electricity | 0 | Active |
| US11873568B2 | Compositions and methods for the electrodeposition of nanotwinned copper | Performing Operations; Transporting | 0 | Active |
| US10294574B2 | Levelers for copper deposition in microelectronics | Chemistry; Metallurgy | 0 | Active |
| US11434578B2 | Cobalt filling of interconnects in microelectronics | Chemistry; Metallurgy | 0 | Active |
| US11643742B2 | Silver/tin electroplating bath and method of using the same | Electricity | 0 | Active |
| US11015255B2 | Selective plating of three dimensional surfaces to produce decorative and functional effects | Performing Operations; Transporting | 0 | Active |
| US12270121B2 | Composition and method for fabrication of nickel interconnects | Electricity | 0 | Active |
| US12157944B2 | Method and wet chemical compositions for diffusion barrier formation | Electricity | 0 | Active |
| US11230778B2 | Cobalt chemistry for smooth topology | Emerging Cross-Sectional Technologies | 0 | Active |
| US12325927B2 | Complex waveform for electrolytic plating | Electricity | 0 | Active |
| US10443135B1 | Near neutral pH pickle on multi-metals | Chemistry; Metallurgy | 0 | Active |
| US10828668B2 | Textured hardcoat films | Performing Operations; Transporting | 0 | Active |
| US11174555B2 | Chromium-free plating-on-plastic etch | Chemistry; Metallurgy | 0 | Active |
| USRE49202E1 | Copper electrodeposition in microelectronics | General | 0 | Active |
| US10081876B2 | Aqueous electrolyte composition having a reduced airborne emission, method and use of this composition | Chemistry; Metallurgy | 0 | Active |
| US10941496B2 | Near neutral pH pickle on multi-metals | Chemistry; Metallurgy | 0 | Active |
| US10865495B2 | Multicorrosion protection system for decorative parts with chrome finish | Emerging Cross-Sectional Technologies | 0 | Active |
| US10995417B2 | Cobalt filling of interconnects in microelectronics | Chemistry; Metallurgy | 0 | Active |
| US11697884B2 | Copper deposition in wafer level packaging of integrated circuits | Electricity | 0 | Active |
| US10508207B2 | Compositions including a high molecular weight acid suitable for conductive polymer formation on dielectric substrate | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.