Kyle Whitten
15Patents
2h-index
13Co-inventors
43Inventor score
Filing activity: Sep 15, 2015 → Jun 7, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11035048B2 | Cobalt filling of interconnects | Electricity | 3 | Active |
| US10519557B2 | Leveler compositions for use in copper deposition in manufacture of microelectronics | Electricity | 2 | Active |
| US11401618B2 | Cobalt filling of interconnects | Electricity | 0 | Active |
| US11807951B2 | Cobalt chemistry for smooth topology | Emerging Cross-Sectional Technologies | 0 | Active |
| US11168406B2 | Leveler compositions for use in copper deposition in manufacture of microelectronics | Electricity | 0 | Active |
| US11434578B2 | Cobalt filling of interconnects in microelectronics | Chemistry; Metallurgy | 0 | Active |
| US11124888B2 | Copper deposition in wafer level packaging of integrated circuits | Electricity | 0 | Active |
| US11384446B2 | Compositions and methods for the electrodeposition of nanotwinned copper | Performing Operations; Transporting | 0 | Active |
| US12270121B2 | Composition and method for fabrication of nickel interconnects | Electricity | 0 | Active |
| US11873568B2 | Compositions and methods for the electrodeposition of nanotwinned copper | Performing Operations; Transporting | 0 | Active |
| US10995417B2 | Cobalt filling of interconnects in microelectronics | Chemistry; Metallurgy | 0 | Active |
| US11230778B2 | Cobalt chemistry for smooth topology | Emerging Cross-Sectional Technologies | 0 | Active |
| US10294574B2 | Levelers for copper deposition in microelectronics | Chemistry; Metallurgy | 0 | Active |
| US11697884B2 | Copper deposition in wafer level packaging of integrated circuits | Electricity | 0 | Active |
| US12398480B2 | Leveler compositions for use in copper deposition in manufacture of microelectronics | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.