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US11946140B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Anantha K. Subramani · San Jose, US
• Seyyed A. Fazeli · Gainesville, US
• Yang Guo · Nanhu, CN
• Ramcharan Sundar · Kanchinakote, IN
• Arun Kumar Kotrappa · Harihara, IN
• Steven Mosbrucker · Santa Clara, US
• Steven Marcus · Tempe, US
• Xinhai Han · Santa Clara, US
• Kesong Hu · Pleasanton, US
• Tianyang Li · San Jose, US
• Philip Allan Kraus · San Jose, US

Key dates

• Filing date: Mar 26, 2021
• Grant date: Apr 2, 2024
• Expiry date: Mar 22, 2042

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J37/32348
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Exemplary substrate processing systems may include a chamber body defining a transfer region. The systems may include a first lid plate seated on the chamber body. The first lid plate may define a plurality of apertures through the first lid plate. The systems may include a plurality of lid stacks equal to a number of the plurality of apertures. The systems may define a plurality of isolators. An isolator may be positioned between each lid stack and a corresponding aperture of the plurality of apertures. The systems may include a plurality of annular spacers. An annular spacer of the plurality of annular spacers may be positioned between each isolator and a corresponding lid stack of the plurality of lids stacks. The systems may include a plurality of manifolds. A manifold may be seated within an interior of each annular spacer of the plurality of annular spacers.