Tailored electron energy distribution function by new plasma source: hybrid electron beam and RF plasma
US12014901B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 25, 2018 |
| Grant date | Jun 18, 2024 |
| Priority date | — |
| Expiry date | Oct 25, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32174
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Embodiments of hybrid electron beam and RF plasma systems and methods are described. In an embodiment a method of using a hybrid electron beam and RF plasma system may include forming a first plasma of a first type in a first region of a wafer processing structure. Additionally, such a method may include forming a second plasma of a second type in a second region of the wafer processing structure, the second region of the wafer processing structure being coupled to the first region of the wafer processing structure, the second plasma being ignited independently of the first plasma, wherein an electron beam formed by the first plasma is configured to modulate one or more characteristics of the second plasma. This hybrid e-beam and RF plasma system provides a source to control electron energy distribution function.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.