Transmission corrected plasma emission using in-situ optical reflectometry
US12031910B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 15, 2021 |
| Grant date | Jul 9, 2024 |
| Priority date | — |
| Expiry date | Jun 4, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/558
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Implementations disclosed describe a system including a light source, an optical sensor, and a processing device. The light source directs, during a first time, a probe light into a processing chamber through a window. The light source ceases, during a second time, directing the probe light into the processing chamber through the window. The optical sensor detects, during the first time, a first intensity of a first light. The first light includes a portion of the probe light reflected from the window and a light transmitted from an environment of the processing chamber through the window. The optical sensor detects, during the second time, a second intensity of a second light. The second light includes the light transmitted from the environment of the processing chamber through the window. The processing device determines, using the first intensity and the second intensity, a transmission coefficient of the window.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.