Patent · US Active

Method to label substrates based on process parameters

US12045555B2 · kind B2 · utility

0Cited by
5References
21Claims
0Family size

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Key dates

Filing dateJan 22, 2019
Grant dateJul 23, 2024
Priority date
Expiry dateDec 8, 2041

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06F2119/18
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

Substrates to be processed are partitioned based on pre-processing data that is associated with substrates before a process step. The data is partitioned using a partition rule and the substrates are partitioned into subsets in accordance with subsets of the data obtained by the partitioning. Corrections are applied, specific to each subset. The partition rule is obtained using decision tree analysis on a training set of substrates. The decision tree analysis uses pre-processing data associated with the training substrates before they were processed, and post-processing data associated with the training substrates after being subject to the process step. The partition rule that defines the decision tree is selected from a plurality of partition rules based on a characteristic of subsets of the post-processing data. The associated corrections are obtained implicitly at the same time.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.