Metrology method and associated computer product
US12105432B2 · kind B2 · utility
0Cited by
3References
20Claims
0Family size
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Key dates
| Filing date | Jul 7, 2020 |
| Grant date | Oct 1, 2024 |
| Priority date | — |
| Expiry date | Oct 28, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70625
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a method comprising measuring radiation reflected from a metrology target and decomposing the measured radiation in components, for example Fourier components or spatial components. Further, there is disclosed a recipe selection method which provides an algorithm to select a parameter of the metrology apparatus based on re-calculated dependencies of 5 the measured radiation based on single components.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.