Method to manufacture nano ridges in hard ceramic coatings
US12111581B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 22, 2019 |
| Grant date | Oct 8, 2024 |
| Priority date | — |
| Expiry date | Jan 7, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6875
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for reducing sticking of an object to a surface used in a lithography process includes receiving, at a control computer, instructions for a tool configured to modify the surface and forming, in a deterministic manner based on the instructions received at the control computer, a modified surface having a furrow and a ridge, wherein the ridge reduces the sticking by reducing a contact surface area of the modified surface. Another apparatus includes a modified surface that includes furrows and ridges forming a reduced contact surface area to reduce a sticking of an object to the modified surface, the ridges having an elastic property that causes the reduced contact surface area to increase when the plurality of ridges is elastically deformed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.