Lithographic apparatus and method with improved contaminant particle capture
US12158706B2 · kind B2 · utility
0Cited by
4References
20Claims
0Family size
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Key dates
| Filing date | Jun 4, 2020 |
| Grant date | Dec 3, 2024 |
| Priority date | — |
| Expiry date | Jun 4, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70916
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus including a substrate stage for supporting a structure in a compartment, the compartment having a compartment surface facing a top surface of the substrate in at least one operational configuration; and a soft coating on the compartment surface for capturing particles. A heat shield or component thereof for a lithographic apparatus, the heat shield or component thereof including a soft coating on at least one surface for capturing particles and a lithographic apparatus including such a heat shield.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.