Cleaning a structure surface in an EUV chamber
US12189313B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 25, 2022 |
| Grant date | Jan 7, 2025 |
| Priority date | — |
| Expiry date | Feb 25, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/463
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In some general aspects, a surface of a structure within a chamber of an extreme ultraviolet (EUV) light source is cleaned using a method. The method includes generating a plasma state of a material that is present at a location adjacent to a non-electrically conductive body that is within the chamber. The generation of the plasma state of the material includes electromagnetically inducing an electric current at the location adjacent the non-electrically conductive body to thereby transform the material that is adjacent the non-electrically conductive body from a first state into the plasma state. The plasma state of the material includes plasma particles, at least some of which are free radicals of the material. The method also includes enabling the plasma particles to pass over the structure surface to remove debris from the structure surface without removing the structure from the chamber of the EUV light source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.