Mirror, in particular for a microlithographic projection exposure apparatus

US12210289B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Kerstin Hild · Schwäbisch Gmünd, DE
• Toralf Gruner · Hennef (Sieg), DE
• Daniel Golde · Oberkochen, DE
• Hans-Michael Stiepan · Aalen, DE
• Vitaliy Shklover · Heidenheim, DE

Key dates

• Filing date: Dec 16, 2022
• Grant date: Jan 28, 2025
• Expiry date: Jun 29, 2043

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10N30/704
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A mirror, e.g. for a microlithographic projection exposure apparatus, includes an optical effective surface, a mirror substrate, a reflection layer stack for reflecting electromagnetic radiation incident on the optical effective surface, at least one first electrode arrangement, at least one second electrode arrangement, and an actuator layer system situated between the first and the second electrode arrangements. The actuator layer system is arranged between the mirror substrate and the reflection layer stack, has a piezoelectric layer, and reacts to an electrical voltage applied between the first and the second electrode arrangements with a deformation response in a direction perpendicular to the optical effective surface. The deformation response varies locally by at least 20% in PV value for a predefined electrical voltage that is spatially constant across the piezoelectric layer.