Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead
US12211709B2 · kind B2 · utility
0Cited by
32References
18Claims
0Family size
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Key dates
| Filing date | Jul 3, 2023 |
| Grant date | Jan 28, 2025 |
| Priority date | — |
| Expiry date | Jul 3, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/334
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Several designs of a gas distribution device for a substrate processing system are provided. The gas distribution device includes a dual plenum showerhead. Additionally, designs for a light blocking structure used with the showerheads are also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.