Method and system for determining a charged particle beam exposure for a local pattern density
US12243712B2 · kind B2 · utility
0Cited by
24References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 3, 2023 |
| Grant date | Mar 4, 2025 |
| Priority date | — |
| Expiry date | Aug 3, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31776
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods and systems for exposing a desired shape in an area on a surface using a charged particle beam system include determining a local pattern density for the area, based on an original set of exposure information. A pre-proximity effect correction (PEC) maximum dose for the local pattern density is determined, based on a pre-determined target post-PEC maximum dose. The pre-PEC maximum dose may be calculated near an edge of the desired shape. Methods also include modifying the original set of exposure information with the pre-PEC maximum dose to create a modified set of exposure information.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.