Remote plasma cleaning of chambers for electronics manufacturing systems
US12249494B2 · kind B2 · utility
0Cited by
5References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 2, 2023 |
| Grant date | Mar 11, 2025 |
| Priority date | — |
| Expiry date | Nov 2, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32889
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of cleaning a chamber for an electronics manufacturing system includes flowing a gas mixture comprising oxygen and a carrier gas into a remote plasma generator. The method further includes generating a plasma from the gas mixture by the remote plasma generator and performing a remote plasma cleaning of the chamber by flowing the plasma into an interior of the chamber, wherein the plasma removes a plurality of organic contaminants from the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.