See-Eng Phan
18Patents
10h-index
34Co-inventors
72Inventor score
Filing activity: Aug 9, 2001 → Nov 2, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7396480B2 | Method for front end of line fabrication | Electricity | 265 | Active |
| US7494545B2 | Epitaxial deposition process and apparatus | Electricity | 241 | Expired |
| US8846163B2 | Method for removing oxides | Electricity | 187 | Active |
| US7520957B2 | Lid assembly for front end of line fabrication | Electricity | 154 | Expired |
| US6726805B2 | Pedestal with integral shield | Electricity | 36 | Expired |
| US6652713B2 | Pedestal with integral shield | Electricity | 31 | Expired |
| US6837968B2 | Lower pedestal shield | Electricity | 27 | Expired |
| US7767024B2 | Method for front end of line fabrication | Electricity | 20 | Active |
| US7252737B2 | Pedestal with integral shield | Electricity | 18 | Expired |
| US8110489B2 | Process for forming cobalt-containing materials | Electricity | 10 | Active |
| US8187970B2 | Process for forming cobalt and cobalt silicide materials in tungsten contact applications | Electricity | 7 | Active |
| US8563424B2 | Process for forming cobalt and cobalt silicide materials in tungsten contact applications | Electricity | 6 | Active |
| US8815724B2 | Process for forming cobalt-containing materials | Electricity | 3 | Active |
| US7513971B2 | Flat style coil for improved precision etch uniformity | Electricity | 1 | Expired |
| US11959167B2 | Selective cobalt deposition on copper surfaces | Electricity | 0 | Active |
| US12249494B2 | Remote plasma cleaning of chambers for electronics manufacturing systems | Electricity | 0 | Active |
| US11384429B2 | Selective cobalt deposition on copper surfaces | Electricity | 0 | Active |
| US11854773B2 | Remote plasma cleaning of chambers for electronics manufacturing systems | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.