System for controlling a critical dimension (CD) uniformity of a magnetic head device
US12254908B2 · kind B2 · utility
0Cited by
4References
17Claims
0Family size
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Key dates
| Filing date | Jun 28, 2023 |
| Grant date | Mar 18, 2025 |
| Priority date | — |
| Expiry date | Jun 28, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/3163
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Systems and methods for controlling a critical dimension (CD) uniformity of a magnetic head device are described. A film stack that is part of a system for controlling a critical dimension (CD) uniformity of a magnetic head device can include a substrate, a magnetoresistive (MR) sensor layer, and a hard mask layer. The system can also include a first mask that defines critical shape patterns other than the CD. The hard mask layer can be patterned using the first mask. The system can also include a second mask that defines the CD. A mandrel pattern can be formed on the hard mask layer using the second mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.