Apparatus for use with hydrogen radicals and method of using same
US12272527B2 · kind B2 · utility
0Cited by
2,223References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 9, 2018 |
| Grant date | Apr 8, 2025 |
| Priority date | — |
| Expiry date | May 9, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/3003
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A system and method suitable for removing both carbon-based contaminants and oxygen-based contaminants from a substrate within a single process chamber are disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.