Patent · US Active

Selective metal removal with flowable polymer

US12272551B2 · kind B2 · utility

0Cited by
3References
23Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 25, 2022
Grant dateApr 8, 2025
Priority date
Expiry dateAug 2, 2043

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/32136
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Embodiments of the disclosure relate to methods for selectively removing metal material from the top surface and sidewalls of a feature. The metal material which is covered by a flowable polymer material remains unaffected. In some embodiments, the metal material is formed by physical vapor deposition resulting in a relatively thin sidewall thickness. Any metal material remaining on the sidewall after removal of the metal material from the top surface may be etched by an additional etch process. The resulting metal layer at the bottom of the feature facilitates selective metal gapfill of the feature.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.